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Nanoscopy Lab
The interaction of materials with intense electromagnetic
radiation modifies the topography and physico-chemical properties
of their surfaces [1]. The top layers are ejected from a surface
in the extreme case called ablation. Ablation efficiency
can be evaluated from the global properties of ablation craters
(diameter, depth, shape) dependent on the properties of the incident
radiation. A detailed look at the damaged surfaces shows the
redistribution and phase transformation of the radiation-affected
material. These observations, supported by the results of in
situ diagnostics, give insight in to the mechanisms of the interaction
between matter and radiation, in our case XUV and/or X-ray, i.e.
short-wavelength radiation.
Laser- induced periodic
surface structures (LIPSS) [2,3] are interesting
phenomena following laser ablation. According to the nature of their
origin LIPSS of two kinds can be distinguished. Most of the observed
LIPSS-I have a spatial period and orientation strongly dependent
on the laser properties (wavelength, polarization, coherence, angle
of incidence). They are created due to the interference of the incident
laser beam with a field scattered along a surface. Structures
of the second kind (LIPSS-II) have spatial periods that are significantly
greater than the laser wavelength and depend more on laser intensity
than wavelength, when a short-wavelength laser is used for
surface irradiation.
[1] D. Bauerle: Laser Processing
and Chemistry, 2nd Ed., Springer-Verlag, Berlin, 1996.
[2] A. E. Siegman and P. M. Fauchet: IEEE
J. Quantum Electron. QE–22, 1384–1403 (1986).
[3] J. E. Sipe, J. F. Young, J. S. Preston
and H. M. van Driel: Phys. Rev. B
27, 1141–1154 (1983).
The Nanoscopy Lab was established at the Institute
of Physics in 2004 as a joint laboratory of the
Department of Laser Plasmas and the Department of Thin
Films. The laboratory is equipped with a Dimension
3100 Scanning Probe Microscope (Veeco) controlled by
a NanoScope IV Control Station (Veeco). This
layout represents a unique tool for analysis of
irradiated surfaces due to the fast and easy application
of atomic force microscopy (AFM)
and scanning tunneling microscopy
(STM) techniques.
Dimension 3100 SPM
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Optical micrograph shows
accurate position of cantilever
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The following characteristics, among others,
deserve to be highlighted:
- large samples (up to 200 mm diameter
and 12 mm thick) can be investigated
- optical microscopy allows accurate specification of cantilever
initial position (see the picture above)
- topography of large areas can be explored by AFM in tapping
mode, e.g. 60 micron × 60 micron scan
can be measured with a tip velocity 10 microns/s
- detailed images with a resolution of ~ 10 nm
can be obtained in various not only topographical modes, e.g.
image of electrical or magnetic properties
- SPM is operated in the air but isolated from vibrational
and electrical noise from surroundings
A Nomarski BX51 microscope equipped with a digital
camera C5060 (both from Olympus) is available in the Nanoscopy Laboratory.
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